Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-05-02

2006-05-02

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000, C310S012060

Reexamination Certificate

active

07038759

ABSTRACT:
An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 MΩ·cm.

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Korean Office Action dated Jun. 22, 2004, issued in a corresponding Korean patent application, No. 10-2002-0039264.

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