Dual capacitor structure for imagers and method of formation

Details Dual capacitor structure for imagers and method of formation Dual capacitor structure for imagers and method of formation

2006-05-02

2006-05-02

Pham, Long (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Junction field effect transistor

C257S184000, C257S222000, C257S257000, C257S291000, C257S292000, C257S298000

Reexamination Certificate

active

07038259

ABSTRACT:
CMOS and CCD imaging devices comprising different in-pixel capacitors and peripheral capacitors and methods of formation are disclosed. The capacitors used in periphery circuits have different requirements from the capacitors used in the pixel itself. Dual stack capacitors comprising two dielectric layers may be provided to achieve low leakage and high capacitance. A single masking step may be provided such that one region has a dual dielectric capacitor and a second region has a single dielectric capacitor. A different dielectric may also be provided in one region compared to another region wherein the inter-electrode insulator comprises a single dielectric in both regions.

REFERENCES:
patent: 4413188 (1983-11-01), Ozawa et al.
patent: 5654565 (1997-08-01), Hokari
patent: 5757040 (1998-05-01), Saito et al.
patent: 6124606 (2000-09-01), den Boer et al.
patent: 2002/0115252 (2002-08-01), Haukka et al.
patent: 2002/0117690 (2002-08-01), Rhodes
patent: WO 00/55919 (2000-09-01), None
S. Simon Wong, et al.—“Electrical Reliability of Cu and Low-K Dielectric Integration,” 1998 MRS Spring Meeting, Symposium E, Paper E7.1, San Francisco, CA, Apr. 16, 1998.
Nam Pham, et al.—“Design and Modeling Methodology for High-Performance Power Distribution Systems,” DesignCon 2002 High-Performance System Design Conference.

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