Graded material and method for synthesis thereof and method...

Stock material or miscellaneous articles – Structurally defined web or sheet – Continuous and nonuniform or irregular surface on layer or...

Reexamination Certificate

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C428S212000, C428S409000, C216S002000, C216S072000, C216S074000, C216S095000

Reexamination Certificate

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06984436

ABSTRACT:
In homogeneous materials, etching characteristics depend on properties inherent in these materials regardless of whether they are isotropic or anisotropic, and there have been limitations in realizing various desired shapes. A subject for the invention is to provide a gradient material which eliminates these limitations.A gradient material is provided in which the rate of etching with a specific chemical substance changes continuously or by steps from the outermost surface to an inner part thereof. This gradient material is made of a main material which contains an additive capable of changing the etching rate of the main material so that the concentration of the additive changes continuously or by steps. Especially when a glass material containing SiO2as the main component is used as the main material and fluorine is used as the additive, then a gradient material in which the rate of etching with an aqueous solution of hydrofluoric acid changes in the depth direction can be obtained.

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patent: 5879424 (1999-03-01), Nishii et al.
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K. Ishii et al.; Effects of Fluorine Addition on the Structure and Optical Properties of SiO2 Films formed by Plasma-Enhanced Chemical Vapor Deposition,; pp. 109-117.
N. Borrelli; Fabrication and Applications of Lens Arrays and Devices; Microoptics Technology; 1999; pp. 1-57.

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