Resist pattern defined by inwardly arched lines

Details Resist pattern defined by inwardly arched lines Resist pattern defined by inwardly arched lines

2006-04-04

2006-04-04

Barreca, Nicole (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaged product

Reexamination Certificate

active

07022440

ABSTRACT:
A device pattern of a semiconductor device. The pattern is defined by a plurality of non-straight lines that are inwardly arched and are formed from plural segments of plural ellipses that are arranged to surround the pattern.

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