Photosensitive coating material for a substrate and process...

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S270100, C430S327000, C430S494000, C430S914000, C430S933000, C396S210000

Reexamination Certificate

active

07029808

ABSTRACT:
A radiation-sensitive coating material, in addition to a base polymer, has a solvent and a radiation-active substance which forms an acid on irradiation by light (including energetic electrons or ions), a fluorescent substance which alters its fluorescence property subject to a change in the acid content of its surroundings. In a process for exposing a substrate coated with the coating material at least one sensor in the exposure chamber of the exposure apparatus measures the intensity of the change in fluorescence spectrum as a function of time during the exposure operation. From the course of intensity at the time of an individual line of the fluorescence spectrum or the intensity integrated over a wavelength interval it is possible to determine the endpoint of the exposure operation by way of electronic algorithms. Deviations from experimentally determined ideal curves of the intensity course provide information on erroneous functions in the course of coating material application and exposure.

REFERENCES:
patent: 6017677 (2000-01-01), Maemoto et al.
patent: 6537719 (2003-03-01), Takahashi
patent: 6566030 (2003-05-01), Grober et al.
patent: 6770407 (2004-08-01), Feke et al.
patent: 6864024 (2005-03-01), Lyons et al.
patent: 2002/0001768 (2002-01-01), Feke et al.
patent: 2002/0042019 (2002-04-01), Grober et al.
patent: 39 14 407 (1990-10-01), None
patent: 0 469 765 (1992-02-01), None
patent: 404213372 (1992-08-01), None
patent: 3507219 (1997-04-01), None
patent: 09219154 (1997-08-01), None
patent: 09319079 (1997-12-01), None
patent: 353045180 (1998-04-01), None
patent: 11338144 (1999-12-01), None
patent: 2003255543 (2003-09-01), None
Julie L. P. Jessop et al.: “Characterizing Acid Mobility in Chemically Amplified Resists via Spectroscopic Methods”,Part of the SPIE Conference on Advances in Resist Technology and Processing XVI, Santa Clara, CA, Mar. 1999, pp. 914-922.
Prof. Dr. Jürgen Falbe et al. (ed.): “Römpp Chemie Lexikon” [RÖMPP Chemistry Dictionary], 9thed., 1990, Georg Thieme Verlag, Stuttgart, Eintrag “Farbe” [listing color], pp. 1298-1300.
Plummer, J. D. et al.: “Silicon VLSI Technology”, Prentice Hall Inc., 2000, pp. 221-226.
DeMent, J.: “Handbook of Chemistry and Physics”, CRC Press, 55thEdition, 1974-1975, pp. D117-D118.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive coating material for a substrate and process... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive coating material for a substrate and process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive coating material for a substrate and process... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3566259

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.