Substrate treatment process and apparatus

Details Substrate treatment process and apparatus Substrate treatment process and apparatus

2006-01-10

2006-01-10

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With spray or jet supplying and/or applying means

C134S137000, C134S140000, C134S144000, C134S147000, C134S148000, C134S151000, C134S184000, C134S199000, C134S902000, C438S905000

Reexamination Certificate

active

06983756

ABSTRACT:
A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed line for feeding the liquid to the nozzle unit, and a chamber enclosing therein the apparatus in its entirety. The nozzle unit is constructed in a form of a bar such that as viewed in plan, the liquid ejected from the nozzle unit reaches the substrate with an area range having a length not smaller than a diameter of the substrate and a width smaller than the diameter of the substrate.

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