Exposure apparatus and method for a semiconductor wafer

Details Exposure apparatus and method for a semiconductor wafer Exposure apparatus and method for a semiconductor wafer

1994-07-13

1996-06-11

Braun, Fred L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 68, 355 69, G03B 2742, H01L 2102

Patent

active

055260934

ABSTRACT:
An exposure apparatus including a scanner for scanning a substrate to be exposed with an exposure beam; and an exposure amount controller for controlling an amount of exposure by the exposure beam in accordance with a position on the substrate. An exposure apparatus including a scanner for scanning a substrate to be exposed with an exposure beam; a detector for detecting a distribution of a film thickness of a radiation sensitive layer on the substrate; and an exposure amount changing controller for controlling an amount of exposure by the exposure beam in accordance with the film thickness distribution.

REFERENCES:
patent: 4422083 (1983-12-01), Neumann et al.
patent: 4750161 (1988-06-01), Takeuchi et al.
Buckley, et al., "Step and Scan: A Systems Overview of a New Lithography Tool," SPIE; Optical/Laser Microlithography II, vol. 1088, 1989, pp. 424 through 433.

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