Method of manufacturing semiconductor device, semiconductor...

Details Method of manufacturing semiconductor device, semiconductor... Method of manufacturing semiconductor device, semiconductor...

2006-04-25

2006-04-25

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

C438S525000

Reexamination Certificate

active

07034318

ABSTRACT:
A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a semiconductor substrate in a θ direction shifted by an angle θ from a vertical direction of the semiconductor substrate, a first stencil mask disposed between the semiconductor substrate and the implantation source, the first stencil mask having a first opening corresponding in the θ direction to the implantation region, and a second stencil mask disposed between the first stencil mask and the implantation source, the second stencil mask having a second opening corresponding in the θ direction to the implantation region.

REFERENCES:
patent: 2002/0058400 (2002-05-01), Suguro et al.
patent: 49-68660 (1974-07-01), None
patent: 2002-203806 (2002-07-01), None
patent: 2002-237447 (2002-08-01), None
patent: WO 02/052622 (2002-07-01), None

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