X-ray optical system for small angle scattering

Details X-ray optical system for small angle scattering X-ray optical system for small angle scattering

2006-01-24

2006-01-24

Bruce, David V. (Department: 2882)

X-ray or gamma ray systems or devices

Beam control

Collimator

C378S070000, C378S084000, C378S150000

Reexamination Certificate

active

06990177

ABSTRACT:
An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.

REFERENCES:
patent: 6041099 (2000-03-01), Gutman et al.
patent: 6226349 (2001-05-01), Schuster et al.
patent: 6330301 (2001-12-01), Jiang
patent: 6504902 (2003-01-01), Iwasaki et al.
patent: 6807251 (2004-10-01), Okanda et al.
patent: 01-172740 (1989-07-01), None
patent: 08-313458 (1996-11-01), None
patent: 09-229879 (1997-09-01), None
patent: 11-287773 (1999-10-01), None
patent: 11-287773 (1999-10-01), None
G. Fujinawa et al: “Parallel-Slit Analyzer Developed for the Purpose of Lowering Tails of Diffraction Profiles”, Journal of Applied Crystallography, Dec. 1, 1999, Munkgaard International Booksellers & Publishers, Denmark, vol. 32, Pt. 2, pp. 1145-1151, XP009029888, ISSN: 0021-8898,—*Figure 2.
Patent Abstracts of Japan, vol. 1999, No. 08, Jun. 30, 1999 and JP 11-072595 A (Rigaku Corp.), Mar. 16, 1999—Abstract only.
Patent Abstracts of Japan, vol. 1997, No. 09, Sep. 30, 1997 and JP 09-119906 A (Rigaku Corp.), May 6, 1997—Abstract only.
H. Klug et al: “X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials”, John Wiley & Sons, New York, U.S.A., 1954, pp. 634-645—entire document.

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