Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Reexamination Certificate
2006-09-19
2006-09-19
Perrin, Joseph L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
C134S153000, C134S902000, C034S060000
Reexamination Certificate
active
07107999
ABSTRACT:
An indexer part, removal processing part, interface, and dry processing part are disposed adjacent to each other in a row. That is, the removal processing part that performs removal processing of an organic matter by using a removal liquid is disposed adjacent to the indexer part loading and unloading a substrate with respect to the exterior of an apparatus. The interface that gives and receives a substrate between the removal processing part and dry processing part is interposed between the removal processing part and the dry processing part that performs dry processing of a substrate after passing through the removal processing. This enables to provide a substrate processing apparatus that can completely dry the substrate after a reaction product removal processing.
REFERENCES:
patent: 5445171 (1995-08-01), Ohmori et al.
patent: 5701627 (1997-12-01), Matsumura et al.
patent: 6245156 (2001-06-01), Taniyama et al.
patent: 6457199 (2002-10-01), Frost et al.
patent: 6550988 (2003-04-01), Sugimoto et al.
Dainippon Screen Mfg. Co,. Ltd.
Ostrolenk Faber Gerb & Soffen, LLP
Perrin Joseph L.
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