Photomask repair method and apparatus

Details Photomask repair method and apparatus Photomask repair method and apparatus

2006-01-31

2006-01-31

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000

Reexamination Certificate

active

06991878

ABSTRACT:
A photomask repair method including scanning an electron beam across a main surface of the photomask, thereby producing a pattern image of the photomask, identifying the position of a defective portion from the pattern image thus produced, and applying an electron beam to a region to be etched including a defective portion under an atmosphere of a gas capable of performing a chemical etching of a film material forming the photomask pattern, thereby removing a defect. In this method, the electron beam to be applied to the region to be etched is a shaped beam. The electron beam is set such that the side of the electron beam is applied in parallel to a borderline between a non-defective pattern and the defect.

REFERENCES:
patent: 4906326 (1990-03-01), Amemiya et al.
patent: 5482802 (1996-01-01), Celler et al.
patent: 5582939 (1996-12-01), Pierrat
patent: 6090507 (2000-07-01), Grenon et al.
patent: 6593040 (2003-07-01), Smith
patent: 2002/0088940 (2002-07-01), Watanabe et al.
patent: 2003/0047691 (2003-03-01), Musil et al.
patent: 3-100655 (1991-04-01), None
patent: 5-100407 (1993-04-01), None
patent: 06-079470 (1994-10-01), None
patent: 2000-010260 (2000-01-01), None
patent: WO00/63946 (2000-10-01), None

Affiliated with

Also associated with

Rating

Photomask repair method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask repair method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask repair method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3547474