Method for fabricating thin film magnetic head

Details Method for fabricating thin film magnetic head Method for fabricating thin film magnetic head

2006-09-19

2006-09-19

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603080, C029S603120, C029S603140, C029S603150, C029S603180, C360S317000

Reexamination Certificate

active

07107667

ABSTRACT:
A first and a second longitudinal bias-applying films are formed via a first mask at both sides of a magnetoresistive effective element film so that the difference in surface level between the magnetoresistive effective element film and the first and the second longitudinal bias-applying films is set within ±20 nm. Then, a first and a second electrode films are formed so as to cover edge portions of the magnetoresistive effective element film and the first and the second longitudinal bias-applying films.

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