Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-05-23
2006-05-23
Alejandro-Mulero, Luz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345480
Reexamination Certificate
active
07047903
ABSTRACT:
A plasma CVD apparatus is used to form thin films of excellent uniform thickness on both surfaces of a substrate without the step of turning a substrate over, and includes two connected vacuum chambers, each of which is equipped with a plurality of electrode array layers therein, whereby at least a pair of substrate holders are transported between adjacent electrode array layers in a first vacuum chamber to form a first thin film on the one surface of substrates facing the electrode array layers, and then transported into a second vacuum chamber so that the other surface of the substrates faces to an electrode array layer to form a second thin film on the other surface.
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Alejandro-Mulero Luz
Buchanan & Ingersoll PC
Ishikawajima-Harima Heavy Industries Co. Ltd.
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