Mechanized retractable pellicles and methods of use

Details Mechanized retractable pellicles and methods of use Mechanized retractable pellicles and methods of use

2006-09-05

2006-09-05

Wells, Nikita (Department: 2881)

Radiant energy

Ionic separation or analysis

C250S492200, C250S492300

Reexamination Certificate

active

07102127

ABSTRACT:
Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a pellicle that is readily retracted during exposure or to provide access to the photomask. The pellicle can be transparent at an inspection wavelength and opaque at an exposure wavelength. In various embodiments, the pellicle is slid, retracted, or pivoted relative to a base aligned with the photomask, thus uncovering the photomask. When overlying the photomask, the pellicle can be secured with magnetic elements, such as magnets or electromagnets. In another embodiment, the pellicle includes a diaphragm having a plurality of shutter leaves that can be opened or closed. Methods of using a pellicle are also described.

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