Method of manufacturing photonic crystal, mask, method of...

Optical waveguides – Planar optical waveguide

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C385S130000, C385S001000

Reexamination Certificate

active

07039285

ABSTRACT:
A method of manufacturing a photonic crystal has the step of:a first step of providing a predetermined film for which a photonic crystal is manufactured; anda second step of irradiating predetermined particles or electromagnetic waves onto a mask having passage sections arrayed based on a cyclic structure predetermined for each region and a mask substrate to hold the passage sections,wherein the mask is constructed so that (a) when the particles are irradiated in the second step, the particles substantially pass through only the passage sections or (b) when the electromagnetic waves are irradiated in the second step, an energy density difference is produced on the film due to a diffraction effect based on the cyclic structure,the direction of the array corresponds to the direction of a fundamental grating vector of the photonic crystal, andthe direction corresponding to the direction of at least one the fundamental grating vector in the each region is consistent throughout all the regions.

REFERENCES:
patent: 4021674 (1977-05-01), Koops
patent: 4562632 (1986-01-01), Parchet et al.
patent: 5008702 (1991-04-01), Tanaka et al.
patent: 5389943 (1995-02-01), Brommer et al.
patent: 6015976 (2000-01-01), Hatakeyama et al.
patent: 6028317 (2000-02-01), Murooka et al.
patent: 6075915 (2000-06-01), Koops et al.
patent: 6093246 (2000-07-01), Lin et al.
patent: 6317554 (2001-11-01), Kosaka et al.
patent: 6542682 (2003-04-01), Cotteverte et al.
patent: 6785454 (2004-08-01), Abe
patent: 2001/0006413 (2001-07-01), Burghoorn
patent: 2001/0026668 (2001-10-01), Yamada
patent: 2002/0146193 (2002-10-01), Hamada
patent: 0 509 342 (1992-10-01), None
patent: 2000-258650 (2000-09-01), None
patent: 2001-105447 (2001-04-01), None
Chinese Official Action dated Feb. 18, 2005, for Application No. 02156170.2 with English translation.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing photonic crystal, mask, method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing photonic crystal, mask, method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing photonic crystal, mask, method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3532154

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.