Method and apparatus to clean an inkjet reagent deposition...

Details Method and apparatus to clean an inkjet reagent deposition... Method and apparatus to clean an inkjet reagent deposition...

2006-03-07

2006-03-07

Hsieh, Shih-Wen (Department: 2861)

Incremental printing of symbolic information

Ink jet

Ejector mechanism

C347S029000, C347S032000

Reexamination Certificate

active

07008037

ABSTRACT:
A method is described for removing residue from a fluid deposited on the interior surface of an inkjet printhead after the printhead has contained or dispensed the fluid at least once. The method makes use of a reverse flushing technique optionally used in combination with sonication. A cleaning station for flushing an inkjet printhead with a wash fluid, rinse fluid, and/or inert gas is provided as well.

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Handbook of Semiconductor Wafer Cleaning Technology, Edited by W. Kern, Noyes Publications.ISBN 0-8155-1331-3, p. 24.

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