Method for fabricating highly conductive vias

Metal working – Method of mechanical manufacture – Electrical device making

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174266, H05K 342

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056197918

ABSTRACT:
The thickness uniformity of a plated metal layer inside a via hole can be enhanced by intersecting a conductive via with an insulating aperture before plating. The new via configuration improves the mass transfer of the plating. It is believed that the apertures lower the local solution ohmic resistance near the via holes. The method can be applied to the manufacture of a wide variety of circuit boards.

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