Method and device for system and/or process monitoring

Details Method and device for system and/or process monitoring Method and device for system and/or process monitoring

2006-07-04

2006-07-04

Gutierrez, Diego (Department: 2859)

Thermal measuring and testing

Thermal testing of a nonthermal quantity

Of susceptibility to thermally induced deteriouration, flaw,...

C374S102000, C374S142000, C374S148000, C374S152000, C702S136000, C702S183000, C702S187000, C702S188000, C073S861120

Reexamination Certificate

active

07070324

ABSTRACT:
The invention relates to a method and to a device for system- and/or process-monitoring in connection with a measurement apparatus that determines/monitors at least one process parameter of a medium. The method and device enable statements to be made regarding the present and future functionality of a measurement apparatus, or individual components of the measurement apparatus. The temperature values (T) of the medium are ascertained directly or indirectly and a trend analysis regarding the thermal loading of the measurement apparatus or the thermal loading of individual components of the measurement apparatus is carried out on the basis of the ascertained temperature values (T) of the medium or on the basis of the derivatives of the ascertained temperature values of the medium.

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