Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

2005-06-28

2005-06-28

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492220, C250S492100, C250S492300

Reexamination Certificate

active

06911661

ABSTRACT:
An electron beam exposure apparatus, which exposes patterns on a wafer by an electron beam, includes an electron beam producing unit which produces the electron beam and an electron beam shaping member having a plurality of openings which shape the electron beam. The 1st ratio, which is a ratio between opening width of the 1st opening among the plurality of the openings in the 1st direction, which is substantially perpendicular to irradiation direction of the electron beam, and pattern width of the pattern, which should be exposed on the wafer by the electron beam shaped by the 1st opening, in the direction corresponding to the 1st direction, and the 2nd ratio, which is a ratio between opening width of the 2nd opening among the plurality of the openings, in the 1st direction, and pattern width of the pattern, which should be exposed on the wafer by the electron beam shaped by the 2nd opening, in the direction corresponding to the 1st direction, are different.

REFERENCES:
patent: 5334282 (1994-08-01), Nakayama et al.
patent: 5751004 (1998-05-01), Robinson et al.
patent: 5932884 (1999-08-01), Aizaki
patent: 6034376 (2000-03-01), Ema
patent: 6114708 (2000-09-01), Kojima et al.
patent: 6175121 (2001-01-01), Yamada et al.
patent: 6232612 (2001-05-01), Nakajima
patent: 6517983 (2003-02-01), Kamon
patent: 6627905 (2003-09-01), Hirayanagi
patent: 5-90140 (1993-04-01), None
patent: 6-338445 (1994-12-01), None
patent: 9-266153 (1997-10-01), None

Affiliated with

Also associated with

Rating

Electron beam exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3518505