Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2005-11-15
2005-11-15
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S296000, C430S942000
Reexamination Certificate
active
06964832
ABSTRACT:
A method is provided for solving a problem that the fine processing property is degraded by an increase of a current applied to complementarily divided masks in an electron beam projection process. In the method, the complementarily divided masks used for electron projection are used whereby one mask is used for patterns requiring high dimensional accuracy and another is used for other patterns. Consequently, it is possible to lower the current applied to the patterns requiring high dimensional accuracy to realize high printing accuracy. In addition, the highly accurate patterns can be formed at a high throughput.
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Takeshi Yamaguchi, “EB Stepper—A High Throughput Electron-Beam Projection Lithography System”, Japanese Journal Applied Physics, vol. 39(2000), pp. 6897-6901.
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Hiroshi Yamashita, “Mask split algorithm for stencil mask in electron projection lithography”, J. Vac. Sci. Technol. B 19(6), Nov./Dec. 2001, pp. 2478-2481.
Fukuda Hiroshi
Moniwa Akemi
Murai Fumio
Yamamoto Jiro
A. Marquez, Esq. Juan Carlos
Fisher Esq. Stanley P.
Reed Smith LLP
Young Christopher G.
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