Method of forming pattern

Details Method of forming pattern Method of forming pattern

2005-08-16

2005-08-16

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

Reexamination Certificate

active

06929967

ABSTRACT:
A method of forming a pattern suitable for fabricating a liquid crystal device which includes the steps of forming a film on a substrate, printing a resist pattern by having the film covered with a screen mask, etching the film using the resist pattern as a mask, and stripping the resist pattern.

REFERENCES:
patent: 4752553 (1988-06-01), Sullivan
patent: 6071827 (2000-06-01), Lim et al.
patent: 6239551 (2001-05-01), Park
patent: 6348233 (2002-02-01), Brody et al.
patent: 6383891 (2002-05-01), Okamoto
patent: 6639315 (2003-10-01), Miura et al.
patent: 2001/0039891 (2001-11-01), Takeuchi et al.
patent: 2001/0046553 (2001-11-01), Umemoto et al.
patent: 2002/0007743 (2002-01-01), Yamasaki et al.
patent: 2002/0034872 (2002-03-01), Kazama et al.
patent: 2003/0048074 (2003-03-01), Ni et al.
patent: 2003/0056665 (2003-03-01), Tanaka
patent: 2003/0151362 (2003-08-01), Alberto et al.
patent: 1993-164059 (1991-10-01), None
patent: 406251704 (1994-09-01), None
patent: 1986-2739 (1986-04-01), None
patent: 1989-5034 (1989-07-01), None

Affiliated with

Also associated with

Rating

Method of forming pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3514940