Retaining ring with trigger for chemical mechanical...

Details Retaining ring with trigger for chemical mechanical... Retaining ring with trigger for chemical mechanical...

2005-11-15

2005-11-15

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

Computer controlled

C451S008000, C451S398000

Reexamination Certificate

active

06964597

ABSTRACT:
A retaining ring for chemical mechanical polishing (CMP) apparatus comprising a body of the retaining ring, and a single trigger cavity, or a plurality of trigger cavities. Each trigger cavity formed inside the body of the retaining ring is filed with gas or fluid, and is configured to indicate that thickness of the retaining ring is less than or equal to a predetermined thickness threshold.

REFERENCES:
patent: 5944593 (1999-08-01), Chiu et al.
patent: 6227009 (2001-05-01), Cusick et al.
patent: 6368189 (2002-04-01), Maloney et al.
patent: 6390908 (2002-05-01), Chen et al.

Affiliated with

Also associated with

Rating

Retaining ring with trigger for chemical mechanical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Retaining ring with trigger for chemical mechanical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Retaining ring with trigger for chemical mechanical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3511644