Photoreceptor fabrication method

Details Photoreceptor fabrication method Photoreceptor fabrication method

1995-05-30

1996-06-11

Goodrow, John

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

G03G 5043

Patent

active

055254519

ABSTRACT:
There is disclosed a method for forming a photosensitive imaging member to be subjected to light of a specific wavelength comprising: depositing a charge generating layer on a substrate, depositing a charge transport layer on the charge generating layer, wherein there is variation in the thickness of the transport layer, and controlling during the deposition of the charge generating layer the thickness of the generating layer as a way to substantially suppress the optical interference effects at the wavelength of illumination due to the variation in the thickness of the transport layer, wherein the thickness of the generating layer is controlled to enable the imaging member to exhibit an optical absorption modulation which is effective for substantially suppressing the optical interference effects.

REFERENCES:
patent: 4618552 (1986-10-01), Tanaka et al.
patent: 4904557 (1990-02-01), Kubo et al.
patent: 5069758 (1991-12-01), Goodrow
patent: 5139907 (1992-08-01), Simpson et al.
patent: 5382486 (1995-01-01), Yu et al.

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