Method of generating large scale signal paths in a parallel...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S030000, C430S311000, C430S394000, C430S396000

Reexamination Certificate

active

06858356

ABSTRACT:
A reticle and method simultaneously generate small- and large-scale circuit structures of a parallel processing system. The reticle includes at least two circuit traces having respective contact pads within an overlap zone of the reticle. Connectivity between a circuit trace of one reticle image with a circuit trace of an adjacent reticle image is controlled by varying the degree of overlap between the two images.

REFERENCES:
patent: 6015641 (2000-01-01), Chou

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