Lithographic apparatus, device manufacturing method, and...

Details Lithographic apparatus, device manufacturing method, and... Lithographic apparatus, device manufacturing method, and...

2005-06-14

2005-06-14

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

06906787

ABSTRACT:
A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.

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patent: 6636297 (2003-10-01), Wakabayashi et al.
patent: 6713795 (2004-03-01), Kuhlmann
patent: 2002/0096728 (2002-07-01), Kuhlmann
patent: 2002/0101574 (2002-08-01), Tsuji
patent: 1 182 511 (2002-02-01), None
patent: 1 331 519 (2003-07-01), None

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