Substrate processing apparatus and method for adjusting a...

Details Substrate processing apparatus and method for adjusting a... Substrate processing apparatus and method for adjusting a...

2005-12-06

2005-12-06

Tran, Khoi H. (Department: 3651)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Article handling

C414S936000, C700S213000

Reexamination Certificate

active

06973370

ABSTRACT:
A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

REFERENCES:
patent: 4955780 (1990-09-01), Shimane et al.
patent: 6086453 (2000-07-01), Fukuoka et al.
patent: 6135854 (2000-10-01), Masumura et al.
patent: 6516244 (2003-02-01), Yoo et al.
patent: 6591160 (2003-07-01), Hine et al.
patent: 6591161 (2003-07-01), Yoo et al.
patent: 6593045 (2003-07-01), Sato et al.
patent: 6648730 (2003-11-01), Chokshi et al.
patent: 6845292 (2005-01-01), Sha et al.
patent: 6915183 (2005-07-01), Iida et al.

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