Method and apparatus for self-referenced dynamic step and...

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

Reexamination Certificate

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C250S559300

Reexamination Certificate

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06906303

ABSTRACT:
A method and apparatus for determining the dynamic scanning distortion present in lithographic scanners. A special reticle pattern is exposed over the full field that is to be characterized. The wafer is then rotated 90 degrees and one or more exposures over the same field are made. Interlocking alignment structures on the resulting developed wafer are then measured and used to reconstruct the dynamic scanner distortion to within a translation, rotation, and scan skew. Alternative embodiments describe techniques for extracting the repeatable part of the dynamic scan error.

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