Projection exposure apparatus and aberration measurement method

Details Projection exposure apparatus and aberration measurement method Projection exposure apparatus and aberration measurement method

2005-12-20

2005-12-20

Statira, Michael P. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

C355S052000

Reexamination Certificate

active

06977728

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern on a substrate, a holding portion for holding an optical element which propagates light toward the projection optical system, a mask which is arranged on or near a plane of an image of the optical element formed by the projection optical system and has a transmission portion, an actuator for driving the optical element along one of focal planes of the projection optical system, and a measurement device for measuring an intensity of light which emerges from the optical element, and passes through the projection optical system and the transmission portion of the mask, while the optical element is driven. The measurement device is disposed at a point in a plane conjugate to a pupil plane of the projection optical system or a point in a plane spaced apart from the mask enough to separately detect respective rays emerging from plural points of the plane.

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