Semiconductor device having a high breakdown voltage for use...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S194000

Reexamination Certificate

active

06903383

ABSTRACT:
A HEMT has an InAlAs layer (202), an InGaAs layer (203), a multiple δ-doped InAlAs layer (204) composed of n-type doped layers (204a) and undoped layers (204b) which are alternately stacked, an InP layer (205), a Schottky gate electrode (210), a source electrode (209a), and a drain electrode (209b) on an InP substrate (201). When a current flows in a region (channel region) of the InGaAs layer (203) adjacent the interface between the InGaAs layer (203) and the multiple δ-doped InAlAs layer (204), a breakdown voltage in the OFF state can be increased, while resistance to the movement of carriers passing through the multiple δ-doped InAlAs layer (204) as a carrier supplying layer is reduced.

REFERENCES:
patent: 4780748 (1988-10-01), Cunningham et al.
patent: 4882609 (1989-11-01), Schubert et al.
patent: 5488237 (1996-01-01), Kuwata
patent: 0 555 886 (1993-08-01), None
patent: 0 780 906 (1997-06-01), None
patent: 0841704 (1998-05-01), None
patent: 61-174775 (1986-08-01), None
patent: 62-035678 (1987-02-01), None
patent: 63-1046 (1988-01-01), None
patent: 5-13446 (1993-01-01), None
patent: 5-226374 (1993-09-01), None
patent: 2000-6210 (2000-01-01), None
patent: 2000-58964 (2000-02-01), None
patent: 2000-269481 (2000-09-01), None
patent: WO00/59162 (2000-05-01), None
Xu D. et al., “Design and Fabrication of Double Modulation Doped Inalas/Ingaas/Inas Heterojunction FET's for High-Speed and Millimeter-Wave Applications”, IEEE Transations on Electron Devices, IEEE Inc. New York, US, vol. 45, No. 1, 1998, pp. 21-30, XP000787870.
Shieh H.M. et al., “Improved GAAS/INO.25GAO.75AS/GAAS Pseudomorphic Heterostructure by Growing Double &-Doping GAAS Layers on both Sides of the Channel”, Solid State Electronics, Elsevier Science Publishers, Barking, GB, vol. 36, No. 9, Sep. 1, 1993, pp. 1235-1237, XP000384258.
Ming-Jer Kao et al., “Improved Selectively-Doped GAAS/INGAAS Double-Quantum-Well Pseudomorphic HFET'S Utilizing a Buried P-Layer on the Buffer”, Japanese Journal of Applied Physics, Tokyo, JP, vol. 32, No. 10B, Oct. 15, 1993, pp. L1503-1505, XP000483951.
Walker, John L. B., ed. “High-Power GaAs FET Amplifiers” (1993).
Daisuke Ueda et al., “Radio-Frequency and Optical Semiconductor Devices Exploring New Age of Data Communication”, IEICE, p. 124, Dec. 1, 1999.
F. Berizzi, et al., “HOS Based Algorithm for Autofocusing of Spotlight SAR Images”, Electronics Letters, vol. 33, No. 7, Mar. 27, 1997.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device having a high breakdown voltage for use... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device having a high breakdown voltage for use..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having a high breakdown voltage for use... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3464926

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.