Lithographic apparatus and method of manufacturing a device

Details Lithographic apparatus and method of manufacturing a device Lithographic apparatus and method of manufacturing a device

2005-10-18

2005-10-18

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S440110, C355S072000, C355S075000, C355S053000, C378S034000, C378S020000, C378S177000, C378S187000

Reexamination Certificate

active

06956222

ABSTRACT:
A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.

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