Thin film transistor array panel

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

Reexamination Certificate

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Details

C257S072000, C349S042000

Reexamination Certificate

active

06855955

ABSTRACT:
A gate wire including a plurality of gate lines, a plurality of gate pads125connected to one ends of the gate lines, and a plurality of gate electrodes123connected to the gate lines, and a storage wire for receiving a common voltage are formed on the substrate. A semiconductor layer and an ohmic contact layer are formed on the gate insulating layer covering the gate wire and the storage wire. A data wire including a plurality of data lines defining a plurality of pixel areas along with the gate lines, a plurality of source electrodes extending onto the semiconductor layer, and a plurality of drain electrodes separated from the source electrodes and opposite the source electrodes with respect to the gate lines is formed thereon. A plurality of storage capacitor conductors overlapping the storage wire to form storage capacitance are formed on the gate insulating layer. The storage capacitor conductors include a plurality of repairing portions extended therefrom and overlapping the gate lines. A passivation layer is formed on the data wire and portions of the semiconductor layer which are not covered with the data wire, and a plurality of pixel electrodes connected to the drain electrodes and the storage capacitor conductors through a plurality of contact holes provide at the passivation layer are formed on the passivation layer.

REFERENCES:
patent: 5042916 (1991-08-01), Ukai et al.
patent: 5929489 (1999-07-01), Deane
patent: 6326641 (2001-12-01), Choi
patent: 6341002 (2002-01-01), Shimizu et al.
patent: 6590226 (2003-07-01), Kong et al.
patent: 6714267 (2004-03-01), Choi et al.
patent: 20020130324 (2002-09-01), Song et al.

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