Processing apparatus and processing method

Details Processing apparatus and processing method Processing apparatus and processing method

2005-05-24

2005-05-24

Stinson, Frankie L. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

Movably mounted fluid-holding receptacles

C134S148000, C134S157000, C134S183000, C134S200000, C134S902000

Reexamination Certificate

active

06895979

ABSTRACT:
A processing apparatus essentially includes a rotatable rotor21for carrying semiconductor wafers W, a motor22for driving to rotate the rotor21,a plurality of processing chambers for surrounding the wafers W carried by the rotor21,for example, an inner chamber23and an outer chamber24,a chemical supplying unit50,an IPA supplying unit60,a rinse supplying unit70and a drying fluid supplying unit80.With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

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