Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-08-28
1992-02-04
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 2041833, G01N 2726, B01D 5702
Patent
active
050857576
ABSTRACT:
An integrated temperature control/alignment system for use with a high performance capillary electrophoretic apparatus comprises a complementary pair of capillary column mounting plates formed from an electrically insulative, high thermal conductivity material for mounting a capillary column. The first mounting plate includes a well having a predetermined circumference, first and second grooves contiguous with the well and ports formed in the grooves and extending through the plate. The second mounting plate includes a plug configured for insertion in the well and ports aligned with the ports of the first mounting plate. Respective ends of the capillary column are seated and locked in the grooves to preposition the capillary column with respect to the ports. Capillary columns of varying lengths may be mounted within the mounting plates by coiling the intermediate portion thereof within the well to increase or decrease the working length of the column in predetermined increments, depending upon the particular application. Optical coupling elements are disposed in the ports to couple sampling and reference radiation to and from the mounted capillary column. The temperature of substantially the entire capillary column is controlled or regulated by at least one thermopile disposed in thermal contact with one of the mounting plates. A thermistor may be thermally coupled to the capillary column or one of the mounting plates to provide feedback signals to operate the thermopile to maintain the capillary column at a predetermined electrophoretic operating temperature.
REFERENCES:
patent: 3677930 (1972-07-01), Meshbane et al.
patent: 3948753 (1976-04-01), Arlinger
patent: 4608146 (1986-08-01), Penaluna
patent: 4624768 (1986-11-01), Yoshida et al.
patent: 4675300 (1987-06-01), Zare et al.
patent: 4898658 (1990-02-01), Karger et al.
patent: 4985129 (1991-01-01), Burd
Patent Abstracts of Japan, vol. 9, No. 273 (P-401) (1996) Oct. 30, 1985, and JP-A-60 119456 (Shimazu Seisakusho K.K.) Jun. 26, 1985.
Karger Barry L.
Nelson Robert J.
Niebling John
Northeastern University
Starsiak Jr. John S.
LandOfFree
Integrated temperature control/alignment system for high perform does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Integrated temperature control/alignment system for high perform, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated temperature control/alignment system for high perform will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-346018