Method of focus monitoring and manufacturing method for an...

Details Method of focus monitoring and manufacturing method for an... Method of focus monitoring and manufacturing method for an...

2005-05-10

2005-05-10

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000

Reexamination Certificate

active

06890692

ABSTRACT:
A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is λ, L/λ is 10, or greater.

REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 20030219655 (2003-11-01), Sutani et al.
patent: 63-306626 (1988-12-01), None
patent: 6-120116 (1994-04-01), None
patent: 11-102061 (1999-04-01), None
patent: P2002-289494 (2002-10-01), None
T.A. Brunner et al., “Simulations and experiments with the phase shift focus monitor”, SPIE vol. 2726, pp. 236-243.

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