Projection exposure apparatus and device manufacturing...

Details Projection exposure apparatus and device manufacturing... Projection exposure apparatus and device manufacturing...

2005-02-08

2005-02-08

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

06853442

ABSTRACT:
A projection exposure apparatus includes a continuous emission excimer laser for providing laser light having a predetermined wavelength, an illumination optical system for illuminating a pattern of a reticle with laser light having the predetermined wavelength, a projection optical system for projecting the illuminated pattern of the reticle onto a substrate, wherein the projection optical system is provided by a lens system made of a substantially single glass material, a laser for injecting light having the predetermined wavelength into a resonator of the continuous emission excimer laser, a wavemeter for measuring the wavelength of the laser light from the continuous emission excimer laser, and a changing device for changing a resonator length of the continuous emission excimer laser on the basis of a signal from the wavemeter so that the wavelength of the laser light from the continuous emission excimer laser becomes equal to the predetermined wavelength.

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patent: 0 820 132 (1998-01-01), None
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patent: 10-163547 (1998-06-01), None
patent: 11-298083 (1999-10-01), None

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