Projection exposure methods and apparatus, and projection...

Details Projection exposure methods and apparatus, and projection... Projection exposure methods and apparatus, and projection...

2005-03-08

2005-03-08

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C359S770000

Reexamination Certificate

active

06864961

ABSTRACT:
Provided is a dioptric projection optical system favorably applicable to projection exposure apparatus used in the lithography step in fabrication of microdevices such as semiconductor devices. This projection optical system includes a positive, front lens unit (GF), an aperture stop (AS), and a positive, rear lens unit (GR) and is a bitelecentric optical system. The optical system satisfies the following condition:in-line-formulae description="In-line Formulae" end="lead"?0.065<f2/L<0.125,in-line-formulae description="In-line Formulae" end="tail"?where f2 is a focal length of the rear lens unit (GR) and L is a distance between an object and an image.The projection optical system includes at least one aspheric surface (ASP1to ASP6).

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