High-luminosity EUV-source devices for use in extreme...

Details High-luminosity EUV-source devices for use in extreme... High-luminosity EUV-source devices for use in extreme...

2005-03-01

2005-03-01

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S50400H, C353S037000, C355S067000, C378S034000

Reexamination Certificate

active

06861656

ABSTRACT:
Devices and methods are disclosed that provide effective utilization of light beams produced from multiple EUV-light sources, especially such sources that have been bundled. An embodiment of an EUV-source device comprises multiple individual EUV-light sources each providing a respective point-light source of EUV radiation propagating as a respective beam from each point-light source. A reflective focusing-optical system is situated downstream of the EUV-light sources, and is configured to focus the beams from the point-light sources at a focus point. A variable-angle mirror is situated downstream of the focusing-optical system and is configured to reflect light of the respective beams from the point-light sources that has been reflected by the focusing-optical system. A mirror-tilting mechanism is coupled to the variable-angle mirror. The mechanism, when activated, tilts the mirror by a respective angle corresponding to the particular beam from one of the point-light sources that is incident on the mirror. This produces a composite beam propagating in a constant direction from the variable-angle mirror.

REFERENCES:
patent: 5002348 (1991-03-01), Wolf
patent: 5309198 (1994-05-01), Nakagawa
patent: 6570168 (2003-05-01), Schultz et al.
patent: 199 35 568 (1999-07-01), None
patent: 1 072 957 (2001-01-01), None
patent: 2001-06840 (2001-03-01), None

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