Process and apparatus for treating semiconductor production...

Details Process and apparatus for treating semiconductor production... Process and apparatus for treating semiconductor production...

2005-10-11

2005-10-11

Langel, Wayne A. (Department: 1754)

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

C422S169000, C422S170000, C422S171000, C423S24000R, C423S241000, C423S245200

Reexamination Certificate

active

06953557

ABSTRACT:
A process and an apparatus for treating exhaust gases, comprising an aeration stirring tank (5) employing an aqueous alkaline liquid, and, as a posterior stage, a gas-liquid contact device (7) and/or a packed column (11). The apparatus can remove at the posterior stage harmful gases that the aeration stirring tank fails to remove, for example, water-soluble organic compounds such as ethanol, halogenated silicon compounds such as SiCl4, and halogen gases such as F2and Cl2. The process and apparatus are particularly suitable for purifying exhaust gases discharged from a semiconductor production device.

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