Vacuum processing apparatus and semiconductor manufacturing...

Drying and gas or vapor contact with solids – Apparatus – Vacuum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C034S060000, C134S085000, C134S902000, C118S730000, C118S719000, C414S939000, C414S940000

Reexamination Certificate

active

06895685

ABSTRACT:
A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

REFERENCES:
patent: 4338883 (1982-07-01), Mahler
patent: 4341582 (1982-07-01), Kohman et al.
patent: 4643629 (1987-02-01), Takahashi
patent: 4670126 (1987-06-01), Messer et al.
patent: 4857160 (1989-08-01), Landau et al.
patent: 4861222 (1989-08-01), Mirkovich
patent: 4908095 (1990-03-01), Kagatsume
patent: 5019233 (1991-05-01), Blake
patent: 5024570 (1991-06-01), Kiriseko et al.
patent: 5139459 (1992-08-01), Takahashi
patent: 5217501 (1993-06-01), Fuse
patent: 5256204 (1993-10-01), Wu
patent: 5286296 (1994-02-01), Sato
patent: 5314509 (1994-05-01), Kato et al.
patent: 5326316 (1994-07-01), Hashimoto
patent: 5336325 (1994-08-01), Devilbiss
patent: 5349762 (1994-09-01), Kato
patent: 5357115 (1994-10-01), Asakawa
patent: 5364222 (1994-11-01), Akimoto
patent: 5376212 (1994-12-01), Saiki
patent: 5417537 (1995-05-01), Miller
patent: 5425812 (1995-06-01), Tsutahara
patent: 5436848 (1995-07-01), Nishida
patent: 5444217 (1995-08-01), Moore
patent: 5445484 (1995-08-01), Kato
patent: 5478195 (1995-12-01), Usami
patent: 5512320 (1996-04-01), Turner et al.
patent: 5527390 (1996-06-01), Ono et al.
patent: 5536128 (1996-07-01), Shimoyashiro
patent: 5548482 (1996-08-01), Takauchi et al.
patent: 5570990 (1996-11-01), Bonora et al.
patent: 5607009 (1997-03-01), Turner
patent: 5618227 (1997-04-01), Tsutsumi
patent: 5672239 (1997-09-01), Deornellas
patent: 5695564 (1997-12-01), Imahashi
patent: 5810935 (1998-09-01), Lee
patent: 5826129 (1998-10-01), Hasebe
patent: 5842824 (1998-12-01), Nishi
patent: 5855726 (1999-01-01), Soraoka
patent: 5868854 (1999-02-01), Kojima et al.
patent: 5905302 (1999-05-01), Lane
patent: 5934856 (1999-08-01), Asakawa et al.
patent: 5944940 (1999-08-01), Toshima
patent: 5950330 (1999-09-01), Kato
patent: 6069096 (2000-05-01), Nishihata
patent: 0502412 (1992-09-01), None
patent: 2056169 (1981-03-01), None
patent: 55 141570 (1980-05-01), None
patent: 60 246635 (1985-12-01), None
patent: 0618153 (1986-03-01), None
patent: 63133532 (1988-06-01), None
patent: 01 064231 (1989-03-01), None
patent: 1305533 (1989-12-01), None
patent: 63209702 (1990-02-01), None
patent: 01188926 (1991-03-01), None
patent: 3 154751 (1991-07-01), None
patent: 01225321 (1992-04-01), None
patent: 02234095 (1992-04-01), None
patent: 02339126 (1992-07-01), None
patent: 03062660 (1993-10-01), None
patent: 04 071331 (1993-10-01), None
patent: 04071692 (1993-10-01), None
patent: 06053304 (1994-02-01), None
patent: 472971 (1994-04-01), None
patent: 630369 (1994-04-01), None
patent: 04247632 (1994-04-01), None
patent: 06097260 (1994-04-01), None
patent: 05021466 (1994-08-01), None
patent: 6314729 (1994-11-01), None
patent: 6314730 (1994-11-01), None
patent: 06155697 (1995-05-01), None
patent: 06033627 (1995-09-01), None
IBM Technical Disclosure Bulletin, vol. 27, No. 12, May 31, 1985, pp. 6997-6998 XP002017023 “Generic work Station”.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum processing apparatus and semiconductor manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum processing apparatus and semiconductor manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum processing apparatus and semiconductor manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3437413

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.