Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-07-19
2005-07-19
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400, C356S625000, C250S559420
Reexamination Certificate
active
06919957
ABSTRACT:
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension, a presence of defects, and a thin film characteristic. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Brown Kyle A.
Bultman Gary
Fielden John
Levy Ady
Nikoonahad Mehrdad
Daffer McDaniel LLP
KLA-Tencor Technologies Corp.
Mowherter Ann Marie
Pham Hoa Q.
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