Single wafer type substrate cleaning method and apparatus

Details Single wafer type substrate cleaning method and apparatus Single wafer type substrate cleaning method and apparatus

2005-07-12

2005-07-12

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S095300, C134S902000

Reexamination Certificate

active

06915809

ABSTRACT:
A single wafer type wet-cleaning apparatus for effectively preventing chemical fluids from flowing to the back face of a wafer when the back face thereof is wet-cleaned by chemical fluids, wherein purified water is injected and supplied to the back face of the wafer while a plurality of chemical fluids is sequentially supplied vertically from above to the wafer, which is rotatably supported, so that the purified water cleans the back face of the wafer and effectively prevents the chemical fluids from flowing to the back face of the wafer.

REFERENCES:
patent: 6115867 (2000-09-01), Nakashima et al.
patent: 6239038 (2001-05-01), Wen
patent: 6247479 (2001-06-01), Taniyama et al.
patent: 2002/0179120 (2002-12-01), Ono et al.
patent: 2003/0047192 (2003-03-01), Ono et al.

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