System and method for maskless lithography using an array of...

Details System and method for maskless lithography using an array of... System and method for maskless lithography using an array of...

2005-05-17

2005-05-17

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492220, C378S034000

Reexamination Certificate

active

06894292

ABSTRACT:
A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.

REFERENCES:
patent: 5900637 (1999-05-01), Smith
patent: 6429443 (2002-08-01), Mankos et al.
patent: 20030122091 (2003-07-01), Almogy

Affiliated with

Also associated with

Rating

System and method for maskless lithography using an array of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for maskless lithography using an array of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for maskless lithography using an array of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3427350