Process for fabricating a mask

Details Process for fabricating a mask Process for fabricating a mask

2005-01-04

2005-01-04

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06838213

ABSTRACT:
A process for fabricating a mask, including depositing a membrane layer on a substrate, etching a backside of the substrate to form membrane windows, depositing at least one scattering layer on the membrane layer depositing a mask layer on the at least one scattering layer exposing the mask layer corresponding to membrane windows to reveal pattern areas, transferring the pattern areas in the mask layer to the at least one scattering layer, transferring at least one of the pattern areas in the at least scattering layer to the membrane layer to produce a hybrid stencil/continuous membrane mask. Alternatively, all of the pattern areas in the at least one scattering layer are transferred to the membrane layer to produce a stencil mask.

REFERENCES:
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patent: 4-240719 (1992-08-01), None
J. A. Liddle, et al., “Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique”, J. Vac. Sci. Technol. B9 (6), Nov./Dec. 1991, pp. .3000-3004.

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