Programmable photolithographic mask system and method

Details Programmable photolithographic mask system and method Programmable photolithographic mask system and method

2005-05-03

2005-05-03

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000

Reexamination Certificate

active

06888616

ABSTRACT:
The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its “open” state) or not transmit light to the wafer (referred to as its “closed” state). The programmable technique is provided for creating a pattern to be imaged onto a wafer that can be implemented as a viable production technique.

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