Thin film capacitor and method of manufacturing the same

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C361S321400, C361S306300, C361S311000, C361S313000, C361S301400, C438S104000, C438S393000, C438S396000

Reexamination Certificate

active

06882516

ABSTRACT:
The present invention comprises the steps of (a) forming a first electrode on a substrate via an adhesion enhancing layer, (b) forming a capacitor insulating film containing a laminated film, in which an amorphous dielectric film and a polycrystalline dielectric film are laminated via a wave-like interface, by forming sequentially and successively the amorphous dielectric film and the polycrystalline dielectric film made of same material on the first electrode, (c) forming a second electrode on the capacitor insulating film, and (d) a step of annealing the capacitor insulating film in an oxygen atmosphere.

REFERENCES:
patent: 5717233 (1998-02-01), Fujii et al.
patent: 5978207 (1999-11-01), Anderson et al.
patent: 5986301 (1999-11-01), Fukushima et al.
patent: 6143597 (2000-11-01), Matsuda et al.
patent: 6190924 (2001-02-01), Lee
patent: 6323057 (2001-11-01), Sone
patent: 6335551 (2002-01-01), Takemura
patent: 6381119 (2002-04-01), Katori
patent: 6507476 (2003-01-01), Shaw et al.
patent: 5-343254 (1993-12-01), None
patent: 9-36309 (1997-02-01), None
patent: 11-330391 (1999-11-01), None
patent: 2000-31403 (2000-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thin film capacitor and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film capacitor and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film capacitor and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3423363

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.