METHOD OF FABRICATING A FLASH MEMORY SEMICONDUCTOR DEVICE BY...

Details METHOD OF FABRICATING A FLASH MEMORY SEMICONDUCTOR DEVICE BY... METHOD OF FABRICATING A FLASH MEMORY SEMICONDUCTOR DEVICE BY...

2005-04-26

2005-04-26

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

C438S015000

Reexamination Certificate

active

06884638

ABSTRACT:
A method for fabricating a flash memory device by determining the active region width (10) of a semiconductor device (27) using a measuring technique for the source drain overdrive current elements (31, 32, 33) having different active region widths and using that difference to establish the difference between the active region width of the devices (31, 32, 33) and the drawn width and using the difference to establish the actual width (10) from drawn width in future devices, and a device thereby fabricated.

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