Scanning exposure method and system

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S067000, C355S071000

Reexamination Certificate

active

06873400

ABSTRACT:
It is an object of the present invention to smoothly join divided patterns adjacent to each other in a synchronous moving direction when a mask and a substrate are moved in synchronization, and the divided patterns are joined and picture-synthesized on the substrate. According to the invention, when the mask and the substrate are moved in synchronization with respect to irradiation with an exposing light, the divided patterns of the mask are projected on the substrate, and a plurality of divided patterns adjacent on the substrate are joined and exposed, the divided patterns adjacent to each other in the synchronous moving direction partially overlap each other.

REFERENCES:
patent: 4769680 (1988-09-01), Resor, III et al.
patent: 5291240 (1994-03-01), Jain
patent: 5528118 (1996-06-01), Lee
patent: 5591958 (1997-01-01), Nishi et al.
patent: 5623853 (1997-04-01), Novak et al.
patent: 5656526 (1997-08-01), Inada et al.
patent: 5729331 (1998-03-01), Tanaka et al.
patent: 5784135 (1998-07-01), Inada et al.
patent: 5854671 (1998-12-01), Nishi
patent: 5874820 (1999-02-01), Lee
patent: 5888676 (1999-03-01), Saitoh
patent: 6078381 (2000-06-01), Suzuki
patent: 6295119 (2001-09-01), Suzuki
patent: 6462807 (2002-10-01), Nishi
patent: 20010041297 (2001-11-01), Nishi
patent: 7-57986 (1995-03-01), None
patent: A 8-166475 (1996-06-01), None
patent: 8-330224 (1996-12-01), None
patent: 10-64782 (1998-03-01), None
patent: A 11-125912 (1999-05-01), None
patent: WO9966370 (1999-12-01), None

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