Method and apparatus for exposing optical disk master

Details Method and apparatus for exposing optical disk master Method and apparatus for exposing optical disk master

2005-05-17

2005-05-17

Edun, Muhammad (Department: 2655)

Dynamic information storage or retrieval

With servo positioning of transducer assembly over track...

Optical servo system

C369S044370, C369S044280, C369S053230

Reexamination Certificate

active

06894959

ABSTRACT:
A method for exposing an optical disk master includes rotating a substrate disk coated with a photoresist, focusing a beam on the photoresist for exposure through an objective lens, and exposing the photoresist so as to form tracks on the substrate disk in its circumferential direction. At this time, the beam is deflected at least temporarily by passing through a deflector. The beam is divided into a first beam and a second beam after passing through the deflector, and the first beam is focused on the photoresist. A difference between the current position and the target position of an optical path of the second beam is detected, and the deflection operation of the deflector is corrected based on the difference so that the optical path of the second beam is located at the target position. This method can improve the track pitch accuracy of an optical disk having a narrow track pitch.

REFERENCES:
patent: 5579298 (1996-11-01), Opheij et al.
patent: 5859819 (1999-01-01), Miyabe et al.

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