Method for growing field oxide to minimize birds' beak length

Details Method for growing field oxide to minimize birds' beak length Method for growing field oxide to minimize birds' beak length

1996-06-12

1998-01-27

Dang, Trung

Fishing, trapping, and vermin destroying

437 70, 437 24, 437 25, 437 26, H01L 2176

Patent

active

057121869

ABSTRACT:
A method for forming field oxide isolation regions using oxygen implantation is described. An oxidation resistant layer such as silicon nitride is formed on a silicon substrate, and acts as an oxidation mask. An opening is then formed in the nitride layer, where field oxide is desired. In one embodiment of the invention, oxygen is implanted into this opening, followed by thermal oxidation. In a second embodiment of the invention, the opening is thermally oxidized, followed by a deep oxygen implant and anneal. Encroachment of the field oxide under the nitride layer is decreased, resulting in a minimum "birds' beak" length.

REFERENCES:
patent: 4398992 (1983-08-01), Fang et al.
patent: 5182226 (1993-01-01), Jang
patent: 5236862 (1993-08-01), Pfiester et al.
patent: 5294563 (1994-03-01), Rao
patent: 5393693 (1995-02-01), Ko et al.

Affiliated with

Also associated with

Rating

Method for growing field oxide to minimize birds' beak length does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for growing field oxide to minimize birds' beak length, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for growing field oxide to minimize birds' beak length will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-341829