Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material
Reexamination Certificate
2005-03-29
2005-03-29
Weiss, Howard (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Organic semiconductor material
C257S295000
Reexamination Certificate
active
06872969
ABSTRACT:
A non-volatile memory device and a matrix display panel using the memory device are provided. The non-volatile memory device includes a source, a drain, an active layer, a gate insulating layer, and a gate. The active layer is formed of an organic semiconductor in a contact region between the source and the drain. The gate-insulating layer is formed of a ferroelectric material on the active layer, and the gate is formed on the gate-insulating layer. Accordingly, the non-volatile memory device and the matrix display panel are very flexible, lightweight multi-programmable and can be easily manufactured.
REFERENCES:
patent: 4860254 (1989-08-01), Pott et al.
patent: 5471417 (1995-11-01), Krautschneider et al.
patent: 5981970 (1999-11-01), Dimitrakopoulos et al.
patent: 6055180 (2000-04-01), Gudesen et al.
patent: 6067244 (2000-05-01), Ma et al.
patent: 6326640 (2001-12-01), Shi et al.
patent: 6532165 (2003-03-01), Katori
patent: 6621098 (2003-09-01), Jackson et al.
patent: WO 9814989 (1998-04-01), None
C.J. Drury et al., Applied Physics Letters, vol. 73 (1998), p. 198 ff.
Japanese Journal of Applied Physics, vol. 4 (1986), p. 60 ff. (polymer ferroelectric materials), by Yamauchi et al.
McGuireWoods LLP
Samsung SDI & Co., Ltd.
Weiss Howard
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